Some properties of metal organic chemical vapor deposited (MOCVD) manganese nitride thin films (MnxNy) obtained using a single precursor of Tetraamminebis-(hexamethylenetetrammine) manganese (II) chloride [Mn (HMTA)2(NH3)4] Cl2
2023Physica B Condensed MatterJournal
10.1016/j.physb.2023.415220Full text3 citations