Effects of O2 and N2 Gas Concentration on the Formation of Ho2O3 Gate Oxide on 4H-SiC Substrate
2022SiliconJournal
10.1007/s12633-022-02040-8Full text9 citations
2022SiliconJournal
10.1007/s12633-022-02040-8Full text9 citations
9 authors across 3 institutions in 3 countries.
as printed: S. Ramesh
Assignment is probabilistic — a work belongs to several fields in proportions.
Several sources describing one work is the point — it means the record rests on more than one authority.
2022 · Silicon · 9 citations
https://openalex.org/W4289731098